An experimental study on elastic electron-trifluoromethane (CHF3) scattering in the low and intermediate energy ranges
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,Atomic and Molecular Physics, and Optics
Reference33 articles.
1. Influence of the RF power on the deposition rate and the chemical surface composition of fluorocarbon films prepared in dry etching gas plasma
2. Cross Section Measurements for Electron-Impact Dissociation ofCHF3into Neutral and Ionic Radicals
3. Electron Collision Data for Plasma Chemistry Modeling
4. Electron Interactions with CHF3
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Absolute differential cross sections for elastic electron scattering from trifluoromethane and 1,1 difluoroethylene;Journal of Electron Spectroscopy and Related Phenomena;2018-01
2. Elastic electron scattering by the CF3radical in the 1–1000 eV energy range;Journal of Physics B: Atomic, Molecular and Optical Physics;2017-06-12
3. Electron collision cross sections of CHF3and electron transport in CHF3and CHF3–Ar mixtures;Japanese Journal of Applied Physics;2014-10-31
4. Elastic Cross Sections for Electron Collisions with Molecules Relevant to Plasma Processing;Journal of Physical and Chemical Reference Data;2010-09
5. Elastic electron scattering from CF3H and CF3I;Journal of Physics B: Atomic, Molecular and Optical Physics;2010-06-17
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