Characterization of Titanium-Based Films Deposited by DC Sputtering Reactive on AISI 1018 Steel

Abstract

Abstract The coated surfaces first layer Ti and second layer TiO2 as coating Nanostructured thin films of using DC sputtering on structural steel (AISI l018) and study characterization of coating SEM/EDS inspection shown a clearly perfect incorporation of layer by dc sputtering a granular structure of the layer with a variable hemisphere’s forms varied from 33 to 46 nm in size. X-XRD test complete for specimen indicates was found anatase phase titanium dioxide, the resulted coating layer of the target of Ti powders gives different morphology from the Ti layer alone The Specimens roughness average of coated Ti and TiO2with respectively was 4.831nm, 7.93 nm. Found that titanium layer will show a major part in increasing the bonding with improving the bond between the substrate steel AISI (1018) and the titanium oxide layer. The Vickers hardness increases when the coating with a layer of titanium with an oxygen content of ceramic layer is formed from 192.3 HV to 227 for Ti as well as important increase was detected in the Tio2 coating to 240 HV. In addition, Ti and Tio2 thin layer considered as a good barrier for hydrogen permeation through steel structure especially at cathode protection in pipelines.