Characteristics of tin droplet target system for EUV source research

Abstract

Abstract Droplet-based laser-produced plasma source shows enormous significance in extreme ultraviolet lithography, which places high demands on the stability of tin droplets. This paper presents a tin droplet target system including the tin droplet generator (DG), droplet diagnosis, and spatiotemporal synchronization of tin droplets and laser. Shadowgraph technology is used to determine the stability of tin droplets. The characteristics of the DG were analyzed, and the operation parameter maps are provided. By varying operating frequencies from 18.4 kHz to 49.3 kHz, the diameter and spacing of droplets can be adjusted in the ranges of 120–200 μm and 200–1100 μm respectively. Both theoretical calculations and experimental results show that tin droplets keep high stability when the operation parameters locate at the optimal range. The long-term lateral stability is also proven under a high degree of vacuum. Additionally, the application feasibility of the DG system is verified by the experiments of laser impact tin droplets.