Facility for extreme ultraviolet reflectometry of lithography optics
Author:
Publisher
IOP Publishing
Subject
General Engineering
Link
http://stacks.iop.org/0026-1394/40/i=1/a=353/pdf
Reference6 articles.
1. Recent developments in EUV reflectometry at the Advanced Light Source
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Report on the CCPR Pilot Comparison: Spectral Responsivity 10 nm to 20 nm;Metrologia;2009-12-21
2. Specular reflectivity of 13.5-nm light from Sn islands deposited on grazing incidence mirror surfaces;Applied Physics A;2008-02-01
3. Narrow-band EUV multilayer coating for the MOSES sounding rocket;SPIE Proceedings;2005-08-18
4. Characterization of prototype optical surfaces and coatings for the EUV reticle imaging microscope;SPIE Proceedings;2005-05-06
5. A simple transfer-optics system for an extreme-ultraviolet synchrotron beamline;Review of Scientific Instruments;2005-04
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