pH driven addressing of silicon nanowires onto Si3N4/SiO2micro-patterned surfaces-Reference-Cited by-同舟云学术

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pH driven addressing of silicon nanowires onto Si3N4/SiO2micro-patterned surfaces

Published:2016-06-08 Issue:29 Volume:27 Page:295602
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Cloarec Jean-Pierre,Chevalier Céline,Genest Jonathan,Beauvais Jacques,Chamas Hassan,Chevolot Yann,Baron Thierry,Souifi Abdelkader

Funder

Lyon National Institute of Applied Sciences (INSA de Lyon)

Institut d’ingénierie et des Systèmes - INSIS - CNRS

Institut des Nanotechnologies de Lyon (INL)

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/27/i=29/a=295602/pdf

Reference33 articles.

1. Experimental Study of Thermodynamic Surface Characteristics and pH Sensitivity of Silicon Dioxide and Silicon Nitride

2. The charge of glass and silica surfaces

3. Molecular interactions between DNA and an aminated glass substrate

4. Surface isoelectric point of evaporated silver films: Determination by contact angle titration

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