Gallium assisted plasma enhanced chemical vapor deposition of silicon nanowires-Reference-Cited by-同舟云学术

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Gallium assisted plasma enhanced chemical vapor deposition of silicon nanowires

Published:2009-03-25 Issue:15 Volume:20 Page:155602
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Zardo I,Yu L,Conesa-Boj S,Estradé S,Alet Pierre Jean,Rössler J,Frimmer M,Roca i Cabarrocas P,Peiró F,Arbiol J,Morante J R,Fontcuberta i Morral A

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/20/i=15/a=155602/pdf

Reference47 articles.

1. Single-electron tunneling in InP nanowires

2. One-dimensional hole gas in germanium/silicon nanowire heterostructures

3. Epitaxial III−V Nanowires on Silicon

4. Nanowire Single-Electron Memory

5. Nanowires' display of potential

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