Atomic nanolithography patterning of submicron features: writing an organic self-assembled monolayer with cold, bright Cs atom beams-Reference-Cited by-同舟云学术

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Atomic nanolithography patterning of submicron features: writing an organic self-assembled monolayer with cold, bright Cs atom beams

Published:2005-06-29 Issue:9 Volume:16 Page:1536-1541
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

O’Dwyer C,Gay G,Lesegno B Viaris de,Weiner J,Camposeo A,Tantussi F,Fuso F,Allegrini M,Arimondo E

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/16/i=9/a=022/pdf

Reference26 articles.

1. Structure and growth of self-assembling monolayers

2. Formation and Structure of Self-Assembled Monolayers

3. Using light as a lens for submicron, neutral-atom lithography

4. Using light as a stencil

5. Laser-Focused Atomic Deposition

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2. Nonlinear Spectroscopy of Alkali Atoms in Cold Medium of Astrophysical Relevance;Atoms;2017-12-06

3. Low-Energy Ions from Laser-Cooled Atoms;Physical Review Applied;2016-05-27

4. Particularities of optical pumping effects in cold and ultra-slow beams of Na and Cs in the case of cyclic transitions;Optics and Spectroscopy;2015-12

5. The distribution of atoms in one-dimensional transverse laser cooling field;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2011-02

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