Peculiarities of temperature dependent ion beam sputtering and channeling of crystalline bismuth-Reference-Cited by-同舟云学术

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Peculiarities of temperature dependent ion beam sputtering and channeling of crystalline bismuth

Published:2014-07-10 Issue:30 Volume:25 Page:305302
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Langegger Rupert,Hradil Klaudia,Steiger-Thirsfeld Andreas,Bertagnolli Emmerich,Lugstein Alois

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/25/i=30/a=305302/pdf

Reference27 articles.

1. Advanced photolithographic mask repair using electron beams

2. The application of advanced techniques for complex focused-ion-beam device modification

3. FIB applications for semiconductor device failure analysis

4. Application of advanced micromachining techniques for the characterization and debug of high performance microprocessors

5. Plan view TEM sample preparation using the focused ion beam lift-out technique

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