Fabrication of ultrahigh density metal–cell–metal crossbar memory devices with only two cycles of lithography and dry-etch procedures-Reference-Cited by-同舟云学术

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Fabrication of ultrahigh density metal–cell–metal crossbar memory devices with only two cycles of lithography and dry-etch procedures

Published:2013-05-20 Issue:24 Volume:24 Page:245303
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Zong B Y,Goh J Y,Guo Z B,Luo P,Wang C C,Qiu J J,Ho P,Chen Y J,Zhang M S,Han G C

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://stacks.iop.org/0957-4484/24/i=24/a=245303/pdf

Reference27 articles.

1. Fundamentals of Microfabrication

2. Springer Handbook of Nanotechnology

3. Read channels for patterned media

4. Metal nanowire grating patterns

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1. Improving the wet chemical patterning of nichrome film by inserting an ultrathin titanium layer;AIP Advances;2016-12

2. Nanopatterning and micropatterning of cobalt containing block copolymers via phase-separation and lithographic techniques;Journal of Polymer Science Part A: Polymer Chemistry;2015-07-17

3. Polypyrrole: FeOx·ZnO nanoparticle solar cells with breakthrough open-circuit voltage prepared from relatively stable liquid dispersions;RSC Adv.;2014

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