Microstructure evolution and coarsening kinetics of semisolid CuSn10P1 alloy under short-time isothermal treatment

Author:

Li YongkunORCID,Yu XiangyangORCID,Zhou Rongfeng,Li Lu,Zhang Yuanbo,Xiao Han

Abstract

Abstract The key success of semisolid rheology is to prepare high-quality semisolid slurries. To achieve that it is necessary to be able to characterize the microstructure, element distribution, and coarsening mechanism during short-time isothermal treatment. This present work applied the enclosed cooling slope channel (ECSC) to make a semisolid slurry of CuSn10P1 alloy. Effects of short-time isothermal treatment (0, 5, 10, 15, 20, 25 s) on microstructure characteristics, element distribution, grain stability, and coarsening kinetics of semisolid CuSn10P1 alloy were studied. The equiaxed or near-globular microstructure can be prepared and improved intergranular segregation of CuSn10P1 alloy through the semisolid slurry short-time isothermal treatment. The mean diameter of primary α-Cu phase gradually increases with soaking time prolonged, but shape factor shows a wavy trend. The mean size and shape factor changes caused by the instability of primary α-Cu phase during short-time isothermal treatment can be described by the melting mechanism and the coarsening mechanism. The relationship between the high Tin layer thickness of primary α-Cu and soaking time is consistent with the linear equation. The relationships of the Sn mass fraction in intergranular microstructure and primary α-Cu phase center versus soaking time are consistent with an exponential equation. The suitable isothermal treatment parameters for the semisolid CuSn10P1 alloy is the soaking time 15 s to 20 s at 990 °C.

Funder

National Natural Science Foundation of China

China Postdoctoral Science Foundation

National and Local Joint Engineering Laboratory of Advanced Metal Solidification Forming and Equipment Technology, Kunming University of Science and Technology

Publisher

IOP Publishing

Subject

Metals and Alloys,Polymers and Plastics,Surfaces, Coatings and Films,Biomaterials,Electronic, Optical and Magnetic Materials

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