Abstract
Abstract
Detailed high pressure Resonance Raman (RR) Spectroscopy and x-ray diffraction (XRD) studies are carried out on 3–4 layered MoSe
2 obtained by liquid exfoliation. Analysis of ambient XRD pattern and RR spectra indicate the presence of a triclinic phase along with its parent hexagonal phase. Slope change in the linear behavior of reduced pressure (H) with respect to Eulerian strain (f
E
) is observed at about 13 GPa in hexagonal phase and at about 17 GPa for the triclinic phase. High pressure Raman measurements using two different pressure transmitting media (PTM) show three linear pressure regions, separated by pressure values around which anomalies in the structure are observed. A broad minimum in the FWHM values of
E
2
g
1
mode at about 10–12 GPa indicate to an electron-phonon coupling. Above 33 GPa the sample completely gets converted to the triclinic structure, which indicates the importance of strain in structural as well as electronic properties of two dimensional materials.
Subject
Metals and Alloys,Polymers and Plastics,Surfaces, Coatings and Films,Biomaterials,Electronic, Optical and Magnetic Materials
Cited by
15 articles.
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