Drop-photochemical deposition of aluminum oxide thin films from aqueous solutions
Author:
Publisher
IOP Publishing
Subject
Metals and Alloys,Polymers and Plastics,Surfaces, Coatings and Films,Biomaterials,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/2053-1591/4/i=4/a=046405/pdf
Reference18 articles.
1. Self-limiting deposition of aluminum oxide thin films by pulsed plasma-enhanced chemical vapor deposition
2. Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
3. Atomic Layer Deposition of Al2O3 Thin Films from a 1-Methoxy-2-methyl-2-propoxide Complex of Aluminum and Water
4. Passivation of Si Wafers by ALD-Al2O3 Films with Different Surface Conditioning
5. High-rate atomic layer deposition of Al2O3 for the surface passivation of Si solar cells
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1. Semiconducting Cu-doped AlOx films fabricated by drop-photochemical deposition;Materials Research Express;2018-12-13
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