The Influence of Au-Doping on Morphology and Visible-Light Reflectivity of TiN Thin Films Deposited by Direct-Current Reactive Magnetron Sputtering
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1088/0256-307X/27/5/056802/pdf
Reference30 articles.
1. Titanium silicide and titanium nitride formation by titanium-ion implantation for MOS LSI applications
2. Properties of Titanium Nitride Films for Barrier Metal in Aluminum Ohmic Contact Systems
3. Chemical and structural analyses of the titanium nitride/alpha (6H)‐silicon carbide interface
4. Combined electrical and mechanical properties of titanium nitride thin films as metallization materials
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1. APCVD prepared TiNxOy films with energy-saving and self-cleaning functions;Journal of Alloys and Compounds;2018-05
2. Origin of Initial Current Peak in High Power Impulse Magnetron Sputtering and Verification by Non-Sputtering Discharge;Chinese Physics Letters;2016-07
3. Alloying-related trends in thermal properties of ternary TiN-based nitrides;International Journal of Modern Physics B;2014-05-04
4. The spectral properties and thermal stability of NbTiON solar selective absorbing coating;Solar Energy Materials and Solar Cells;2012-01
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