Emission Spectroscopy for Hot Filament Diamond Growth Process with Positive Substrate Biasing
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1088/0256-307X/13/3/010/pdf
Reference10 articles.
1. Emission spectroscopy diagnostics of a d.c. plasma jet diamond reactor
2. Mole fractions of H, CH3, and other species during filament‐assisted diamond growth
3. Infrared detection of gaseous species during the filament‐assisted growth of diamond
4. Two-photon excited LIF determination of H-atom concentrations near a heated filament in a low pressure H_2 environment
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1. Balmer-alpha and Balmer-beta Stark line intensity profiles for high-power hydrogen inductively coupled plasmas;Chinese Physics B;2014-07
2. Analysis of optical emission spectroscopy in diamond chemical vapor deposition;Diamond and Related Materials;2000-09
3. THE NUCLEATION AND GROWTH OF (100) TEXTURED DIAMOND FILMS IN PRESENCE OF NITROG EN;Acta Physica Sinica;2000
4. The influence of bias on gaseous composition and diamond growth in a hot-filament chemical vapour deposition process;Journal of Physics D: Applied Physics;1996-11-14
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