Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering-Reference-Cited by-同舟云学术

Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering

Published:2005-07-29 Issue:8 Volume:22 Page:2106-2108
ISSN:0256-307X
Container-title:Chinese Physics Letters
language:
Short-container-title:Chinese Phys. Lett.

Author:

Hong-Chang Wang,Zhan-Shan Wang,Shu-Min Zhang,Wen-Juan Wu,Zhong Zhang,Zhong-Xiang Gu,Yao Xu,Feng-Li Wang,Xin-Bin Cheng,Bei Wang,Shu-Ji Qin,Ling-Yan Chen

Publisher

IOP Publishing

Subject

General Physics and Astronomy

Reference11 articles.

1. Structure and surface morphology of epitaxial Ni films grown on MgO(111) substrates: growth of high quality single domain films

2. Magnetization and microstructure of Ni films prepared by dc magnetron sputtering

3. In-situ TEM tensile testing of DC magnetron sputtered and pulsed laser deposited Ni thin films

4. Epitaxial variations of Ni films grown on MgO(001)

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