Comparative Studies on the Laser Damage Resistance of Ta 2 O 5 and Nb 2 O 5 Films Performed under Different Electron Beam Currents
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1088/0256-307X/28/6/064211/pdf
Reference15 articles.
1. Influence of Different Substrates on Laser Induced Damage Thresholds at 1064 nm of Ta 2 O 5 Films
2. Effects of deposition parameters on laser-induced damage threshold of Ta2O5 films
3. A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film
4. Development of surface thermal lensing technique in absorption and defect analyses of optical coatings
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2. Effects of Oxygen Vacancies and Cation Valence States on the Triboelectric Property of Substoichiometric Oxide Films;ACS Applied Materials & Interfaces;2021-07-23
3. Preparation of high laser-induced damage threshold sol-gel Nb2O5 films with different additives;Optik;2020-03
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5. Preparation of Ta-Doped TiO 2 Using Ta 2 O 5 as the Doping Source;Chinese Physics Letters;2015-08
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