Thickness Measurement of Gold Deposits

Author:

Reid F.H.

Abstract

In both decorative and industrial applications of gold plating, but even more critically in the latter, accurate measurement of coating thickness is of vital importance to both the manufactuer and the user. To the former, working to increasingly stringent specifications, it may, in extreme cases, mean the difference between profit and loss if an excessive thickness is inadvertently applied due to some change in electrolyte or processing conditions, or if an unduly high average thickness must be used on barrel or vat plated components to ensure a minimum requirement on functional areas. To the user, it can equally mean the difference between operational success and failure of a gold plated part if plating thickness is below specification and the means used for measurement are not sufficiently precise to detect this. Control of coating thickness in gold plating is therefore a matter of vital concern, and never more so than at the present time when, in the face of the spectacular price increases of recent years, and in the virtual absence of viable alternatives to meet the exacting demands of applications in printed circuitry, semiconductor technology and the electronics industry in general, the need for maximum economy in gold usage has become increasingly urgent, as evidenced by the vigorous efforts currently devoted to the development and improvement of selective plating techniques, and the recent interest manifest in the possible replacement of essentially pure gold coatings by alloy deposits of 18 carat and lower where these may be technically acceptable. The present article offers a wide‐ranging survey of methods available for thickness measurement, with particular reference to gold plating, but including also some techniques which, whilst not finding current use, may be of potential interest in this context.

Publisher

Emerald

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering

Reference27 articles.

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3