A conceptual model of technology features and technostress in telemedicine communication

Abstract

PurposeThis paper aims to provide systemic understanding with regard to the adoption of computer mediated communication (CMC) technology and its impact on technostress levels.Design/methodology/approachBased on the theoretical lens rooted in the psychology literature and emerging problems observed through engagement with organizations in their field research, the authors propose a conceptual model that articulates technology characteristics in telemedicine communication. The model defines both the antecedents and outcomes of technostress, emphasizing investigation of the underlying mechanisms of the overall process in regard to fit between users and adopted technologies.FindingsIn order to understand the impact of technostress on telemedicine users, it is necessary to investigate the “black box” of how technology influences stressors. According to the theoretical lens of person‐environment (P‐E) theory, stress occurs when there is a misfit between individuals’ characteristics and environmental settings. Congruent with the premises of the theory, the fit in the authors’ model is conceptualized in two dimensions: complementary fit and supplementary fit. Communication and information support is crucial to meet the ability‐demand fit; social presence and social support are important to assist in the match between an individual's supply and social norm. Personal innovativeness of IT has a moderating effect on the relationship between technostressors and strain.Practical implicationsThe proposed model identifies the antecedents of technostressors in regard to the use of telemedicine technologies, and provides the means to examine the process systematically. It could be useful for administrators to constitute organizational strategy to alleviate stress levels, thus improving work performance and quality of working life.Originality/valueThe authors adapt the person‐technology model (P‐T model) to the CMC featured telemedicine context and further extend the model to reveal both antecedents of technostress and the moderators that affect the ultimate stressful syndrome. Instead of treating the misfit indirectly by its consequence, the present study not only emphasizes revealing the mechanism by investigating the misfit process but it also brings additional understanding to the technostress domain.