Modeling effects of oxygen inhibition in mask‐based stereolithography-Reference-Cited by-同舟云学术

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Modeling effects of oxygen inhibition in mask‐based stereolithography

Published:2011-04-26 Issue:3 Volume:17 Page:168-175
ISSN:1355-2546
Container-title:Rapid Prototyping Journal
language:en
Short-container-title:Rapid Prototyping Journal

Author:

Jariwala Amit S.,Ding Fei,Boddapati Aparna,Breedveld Victor,Grover Martha A.,Henderson Clifford L.,Rosen David W.

Publisher

Emerald

Subject

Industrial and Manufacturing Engineering,Mechanical Engineering

Reference16 articles.

1. A kinetic gelation method for the simulation of free-radical polymerizations

2. Polymerization.

3. Polymers and polyfunctionality

4. Kinetic approach of oxygen inhibition in ultraviolet- and laser-induced polymerizations

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