High-resolution stereolithography: Negative spaces enabled by control of fluid mechanics

Author:

Coates Ian A.1ORCID,Pan William2,Saccone Max A.13ORCID,Lipkowitz Gabriel2ORCID,Ilyin Dan2,Driskill Madison M.1,Dulay Maria T.3,Frank Curtis W.1,Shaqfeh Eric S. G.12ORCID,DeSimone Joseph M.13

Affiliation:

1. Department of Chemical Engineering, Stanford University, Stanford, CA 94305

2. Department of Mechanical Engineering, Stanford University, Stanford, CA 94305

3. Department of Radiology, Stanford University, Stanford, CA 94305

Abstract

Stereolithography enables the fabrication of three-dimensional (3D) freeform structures via light-induced polymerization. However, the accumulation of ultraviolet dose within resin trapped in negative spaces, such as microfluidic channels or voids, can result in the unintended closing, referred to as overcuring, of these negative spaces. We report the use of injection continuous liquid interface production to continuously displace resin at risk of overcuring in negative spaces created in previous layers with fresh resin to mitigate the loss of Z-axis resolution. We demonstrate the ability to resolve 50-μm microchannels, breaking the historical relationship between resin properties and negative space resolution. With this approach, we fabricated proof-of-concept 3D free-form microfluidic devices with improved design freedom over device material selection and resulting properties.

Funder

Bill and Melinda Gates Foundation

Publisher

Proceedings of the National Academy of Sciences

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