Author:
Sun Ke,Saadi Fadl H.,Lichterman Michael F.,Hale William G.,Wang Hsin-Ping,Zhou Xinghao,Plymale Noah T.,Omelchenko Stefan T.,He Jr-Hau,Papadantonakis Kimberly M.,Brunschwig Bruce S.,Lewis Nathan S.
Abstract
Reactively sputtered nickel oxide (NiOx) films provide transparent, antireflective, electrically conductive, chemically stable coatings that also are highly active electrocatalysts for the oxidation of water to O2(g). These NiOx coatings provide protective layers on a variety of technologically important semiconducting photoanodes, including textured crystalline Si passivated by amorphous silicon, crystalline n-type cadmium telluride, and hydrogenated amorphous silicon. Under anodic operation in 1.0 M aqueous potassium hydroxide (pH 14) in the presence of simulated sunlight, the NiOx films stabilized all of these self-passivating, high-efficiency semiconducting photoelectrodes for >100 h of sustained, quantitative solar-driven oxidation of water to O2(g).
Funder
U.S. Department of Energy
Gordon and Betty Moore Foundation
Publisher
Proceedings of the National Academy of Sciences
Cited by
179 articles.
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