Island Growth during the Crystallization of Amorphous Ge48Te52 Films

Author:

Libera M.,Chen M.

Abstract

Microstructural TEM studies have been combined with temperature-dependent measurements of laser reflection and transmission to study crystallization in amorphous films of near-stoichiometric germanium telluride. The transformation proceeds by rapid growth of crystalline islands through the film thickness followed by two-dimensional growth in the film plane. Isothermal studies find an Avrami exponent of 4.5 suggesting a non-linear crystal growth rate.75nm of Ge48Te52 was deposited by co-evaporation from separate Knudsen cells onto Si, carbon-coated mica, and glass substrates. Compositions were determined by x-ray fluorescence from films deposited on silicon.

Publisher

Cambridge University Press (CUP)

Subject

General Medicine

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