Abstract
Since the early work of Bishop in the 1960's, many have used Monte Carlo techniques for studying the role of electron scattering in the X-ray production process, but the simulation of individual trajectories has always proved too slow to be of use for online analysis. The paper describes a simple model for calculating the distribution curves of ionisation with depth ϕ(ρz) for a variety of target conditions, which are then characterised by a type of exponential expression capable of much faster computation. This expression is built into a practical correction procedure which can be applied to the analysis of all elements from boron upwards.The Monte Carlo model uses a simple multiple scattering cross-section with 50-step trajectories. This cross-section is adjusted to give the correct variation of backscatter coefficient with target atomic number, as shown in Figure 1, and this is the only physical parameter which it is necessary to fit empirically.
Publisher
Cambridge University Press (CUP)