Drift–Alfvén vortices in dusty plasmas with non-zero ion-temperature effects

Author:

POKHOTELOV O. A.,ONISHCHENKO O. G.,SHUKLA P. K.,STENFLO L.

Abstract

Reduced two-fluid equations governing the nonlinear dynamics of drift–Alfvén waves in dusty plasmas with non-zero ion temperature are derived. In the linear limit, we find a dispersion relation that shows the coupling between the ion-drift–Shukla–Varma mode, and electron-drift (magnetostatic) and (inertial or kinetic) Alfvén waves due to the finite collisionless electron skin depth or Larmorradius corrections. In contrast to the case of an electron–ion plasma, when the nonlinear drift–Alfvén vortices are weakly localized, i.e. decrease at infinity as r−1, the presence of the charged dust grains makes exponential localization possible. The physical meaning of such a localization is connected with the fact that charged massive dust granules provide an additional screening that results in stronger localization of the vortex. In several intermediate-β plasmas with 1 [Gt ] β [Gt ] me/mi (me,i is the electron or ion mass), the localization length approaches a minimum value when the vortex velocity is of the order of the ion diamagnetic drift. It then reaches the value ρiδ−1/4d where ρi is the ion Larmor radius and δd is the ratio of the dust to ion densities multiplied by the dust charge number Zd. In the case of very low plasma pressure, β [Lt ] me/mi, the vortex is localized with typical scale (λeρi)1/2δ−1/4d where λe is the electron skin depth. Our investigation can thus predict the velocities of coherent nonlinear structures in space plasmas.

Publisher

Cambridge University Press (CUP)

Subject

Condensed Matter Physics

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3