Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication
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Published:2023-11-13
Issue:
Volume:12
Page:
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ISSN:2095-4719
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Container-title:High Power Laser Science and Engineering
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language:en
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Short-container-title:High Pow Laser Sci Eng
Author:
Hu ChenORCID,
Wan Songlin,
Jiang Guochang,
Gu Haojin,
Zhang Yibin,
Jin YunxiaORCID,
Liu Shijie,
Zhao Chengqiang,
Cao Hongchao,
Wei Chaoyang,
Shao Jianda
Abstract
Abstract
The large-aperture pulse compression grating (PCG) is a critical component in generating an ultra-high-intensity, ultra-short-pulse laser; however, the size of the PCG manufactured by transmission holographic exposure is limited to large-scale high-quality materials. The reflective method is a potential way for solving the size limitation, but there is still no successful precedent due to the lack of scientific specifications and advanced processing technology of exposure mirrors. In this paper, an analytical model is developed to clarify the specifications of components, and advanced processing technology is adopted to control the spatial frequency errors. Hereafter, we have successfully fabricated a multilayer dielectric grating of 200 mm × 150 mm by using an off-axis reflective exposure system with Φ300 mm. This demonstration proves that PCGs can be manufactured by using the reflection holographic exposure method and shows the potential for manufacturing the meter-level gratings used in 100 petawatt class high-power lasers.
Funder
National Key Research and Development Program of China
Natural Science Foundation of Shanghai Municipality
Publisher
Cambridge University Press (CUP)
Subject
Nuclear Energy and Engineering,Nuclear and High Energy Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
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