1178 J, 527 nm near diffraction limited laser based on a complete closed-loop adaptive optics controlled off-axis multi-pass amplification laser system

Author:

Wang Deen,Zhang Xin,Dai Wanjun,Yang Ying,Deng Xuewei,Chen Lin,Xie Xudong,Hu Dongxia,Jing Feng,Yang Zeping,Yuan Qiang,Wei Xiaofeng,Zhu Qihua,Zheng Wanguo,Zhang Xiaomin,Huang Lei

Abstract

Abstract A 1178 J near diffraction limited 527 nm laser is realized in a complete closed-loop adaptive optics (AO) controlled off-axis multi-pass amplification laser system. Generated from a fiber laser and amplified by the pre-amplifier and the main amplifier, a 1053 nm laser beam with the energy of 1900 J is obtained and converted into a 527 nm laser beam by a KDP crystal with 62% conversion efficiency, 1178 J and beam quality of 7.93 times the diffraction limit (DL). By using a complete closed-loop AO configuration, the static and dynamic wavefront distortions of the laser system are measured and compensated. After correction, the diameter of the circle enclosing 80% energy is improved remarkably from 7.93DL to 1.29DL. The focal spot is highly concentrated and the 1178 J, 527 nm near diffraction limited laser is achieved.

Publisher

Cambridge University Press (CUP)

Subject

Nuclear Energy and Engineering,Nuclear and High Energy Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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