High Throughput Sample Preparation and Analysis Using an Inductively Coupled Plasma (ICP) Focused Ion Beam Source-Reference-Cited by-同舟云学术

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High Throughput Sample Preparation and Analysis Using an Inductively Coupled Plasma (ICP) Focused Ion Beam Source

Published:2010-07 Issue:S2 Volume:16 Page:222-223
ISSN:1431-9276
Container-title:Microscopy and Microanalysis
language:en
Short-container-title:Microsc Microanal

Author:

Kellogg S,Schampers R,Zhang S,Graupera A,Miller T,Laur WD,Dirriwachter A

Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Publisher

Cambridge University Press (CUP)

Subject

Instrumentation

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