Abstract
Electron beam X-ray microanalysis with semiconductor energy-dispersive
spectrometry (EDS) performed with standards and calculated matrix
corrections can yield quantitative results with a distribution such that
95% of analyses fall within ±5% relative for major and minor
constituents. Standardless methods substitute calculations for the
standard intensities, based either on physical models of X-ray generation
and propagation (first principles) or on mathematical fits to remotely
measured standards (fitted standards). Error distributions have been
measured for three different standardless analysis procedures with a suite
of microanalysis standards including metal alloys, glasses, minerals,
ceramics, and stoichiometric compounds. For the first-principles
standardless procedure, the error distribution placed 95% of analyses
within ±50% relative, whereas for two commercial fitted standards
procedures, the error distributions placed 95% of analyses within
±25% relative. The implication of these error distributions for the
accuracy of analytical results is considered, and recommendations for the
use of standardless analysis are given.
Publisher
Cambridge University Press (CUP)
Cited by
39 articles.
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