Electrochemical Characteristics of HA Film on the Ti Alloy Using Pulsed Laser Deposition-Reference-Cited by-同舟云学术

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Electrochemical Characteristics of HA Film on the Ti Alloy Using Pulsed Laser Deposition

Published:2010-05-05 Issue:5 Volume:50 Page:395-400
ISSN:1738-8228
Container-title:Korean Journal of Metals and Materials
language:
Short-container-title:Korean J. Met. Mater.

Author:

Choe Han-Cheol,Jeong Yong-Hoon,Shin Seung-Pyo,Chung Chae-Heon,Kim Sang-Sub

Publisher

The Korean Institute of Metals and Materials

Subject

Metals and Alloys,Surfaces, Coatings and Films,Modeling and Simulation,Electronic, Optical and Magnetic Materials

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. In vitro biological response to the oxide layer in pure titanium formed at different current densities by plasma electrolytic oxidation;Applied Surface Science;2014-09

2. Formation of β-tricalcium phosphate coating layer on titanium via micro-arc oxidation;Materials Research Innovations;2014-05

3. Electrochemical response of ZrO2 incorporated titanium oxide film;Materials Research Innovations;2014-05

4. Deposition of hydroxyl-apatite on titanium subjected to electrochemical plasma coating;Electrochimica Acta;2013-10

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