Property of Nano-thick Silicon Films Fabricated by Low Temperature Inductively Coupled Plasma Chemical Vapor Deposition Process
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Published:2011-04-05
Issue:4
Volume:49
Page:313-320
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ISSN:1738-8228
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Container-title:Korean Journal of Metals and Materials
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language:
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Short-container-title:Korean J. Met. Mater.
Author:
Song Ohsung,Shen Yun,Sim Gapseop,Choi Yongyoon
Publisher
The Korean Institute of Metals and Materials
Subject
Metals and Alloys,Surfaces, Coatings and Films,Modelling and Simulation,Electronic, Optical and Magnetic Materials