Exploiting the Oxygen Inhibitory Effect on UV Curing in Microfabrication: A Modified Lithography Technique

Author:

Alvankarian Jafar,Majlis Burhanuddin Yeop

Publisher

Public Library of Science (PLoS)

Subject

Multidisciplinary

Reference20 articles.

1. Large-area, high-aspect-ratio SU-8 molds for the fabrication of PDMS microfluidic devices;S Natarajan;Journal of Micromechanics and Microengineering,2008

2. Alvankarian J, Bahadorimehr A, Davaji B, Majlis BY. Inst. of Microeng. & Nanoelectron (IMEN), Univ. Kebangsaan Malaysia (UKM), Bangi, Malaysia. Semiconductor Electronics (ICSE), 2012 10th IEEE International Conference on. IEEE. pp. 333–335.

3. Frontal Photopolymerization for Microfluidic Applications;JT Cabral;Langmuir,2004

4. Photopolymers as a powerful tool in modern technology;N Bühler;Pure and applied chemistry,1995

5. Mechanisms, polymerization rate scaling, and oxygen inhibition with an ultra-rapid monovinyl urethane acrylate;NB Cramer;Polymer,2008

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