New Microscopic Polishing with Magnetic Compound Fluid (MCF)

Author:

Shimada Kunio1,Akagami Yoichi2,Kamiyama Shinichi3,Fujita Toyohisa4,Miyazaki Toshio4,Shibayama Astushi4

Affiliation:

1. Akita Prefectural University, 84-4 Aza-Ebinokuchi, Tsuchiya, Honjyo, 015-0055, Japan,

2. Akita Prefectural Industrial Technology Center, 4-11 Aza-Sanuki, Arayamachi, Akita 010-1623, Japan

3. Akita Prefectural University, 84-4 Aza-Ebinokuchi, Tsuchiya, Honjyo, 015-0055, Japan

4. Akita University, 1-1 Tegatagakuenmachi, Akita 010-8502, Japan

Abstract

We propose a magnetic compound fluid (MCF) as a new smart fluid. This fluid includes nm size magnetite and mm size iron particles in a solvent. The magnetic effect can be expected to demonstrate between the magnetic fluid (MF) and magneto-rheological fluid (MRF). Moreover, the magnitude of the shear stress to the shear rate under steady magnetic field can be larger than MRF by varying the compound rate of the MF and MRF. This report shows an experimental application of microscopic polishing with the MCF. We examined the surface roughness of flat titanium material to the attached rotating plate with 15 rpm under magnetic field. By comparing the roughness between the MCF and the MR, the polished plate is more uniformly over the plate with the MCF than the MR. Further the roughness of Ry and Ra are larger under fluctuating magnetic field than steady magnetic field. The more effective polishing can be explained with the cluster model of particles.

Publisher

SAGE Publications

Subject

Mechanical Engineering,General Materials Science

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