Numerical investigation of wetting front migration and soil water distribution under vertical line source irrigation with different influencing factors

Author:

Fan Yanwei1,Ma Liangjun1,Wei Hujun1,Zhu Pengcheng1

Affiliation:

1. College of Energy and Power Engineering, Lanzhou University of Technology, Lanzhou 730050, China

Abstract

Abstract Vertical line source irrigation (VLSI) is an underground irrigation method suitable for deep-rooted plants. Understanding the characteristics of the soil wetting body of the VLSI was the key to designing this irrigation system. On the basis of experimental verification of the reliability of the HYDRUS simulation results of VLSI under the conditions of soil texture (ST), initial water content (θi), line source buried depth (B), line source diameter (D) and line source length (L), numerical studies of the migration law of the wetting front of VLSI and the distribution characteristics of soil moisture were performed. The wetting front migration (WFM) was mainly influenced by ST, θi, D and L (P < 0.05), while B had little effect on WFM (P > 0.05). The shape of the soil wetting body changed little under different influencing factors. The water content contour was approximately ‘ellipsoidal’ around the line source. The soil moisture near the line source was close to the saturated moisture content. The moisture content around the line source gradually decreased outward, and the contour lines gradually became dense. According to the simulation results, a prediction model of multiple factors influencing the migration process of the VLSI wetting front was established. The predicted value was in good agreement with the measured value. The results of this research could provide a theoretical basis for further optimizing the combination of VLSI and irrigation elements.

Funder

National Natural Science Foundation of China

Hongliu Supporting Discipline of Lanzhou University of Technology.

the Natural Science Foundation of Gansu Province, Chin

Publisher

IWA Publishing

Subject

Water Science and Technology

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