NDMA formation potential removal in treated effluent by UV/H2O2 process
Author:
Affiliation:
1. Department of Civil and Environmental Engineering, National University of Singapore, Block E1A, #07-03, No. 1 Engineering Drive 2, Singapore 117576, Singapore
Abstract
Publisher
IWA Publishing
Subject
Filtration and Separation,Water Science and Technology
Link
http://iwaponline.com/jwrd/article-pdf/6/1/156/377204/jwrd0060156.pdf
Reference28 articles.
1. Impact of lamp choice and H2O2 dose on photodegradation of nitrobenzene;Bandy;Environ. Eng. Sci.,2009
2. Influence of ultraviolet light coupled with hydrogen peroxide treatment on organic nitrogen and carbon precursors and disinfection by-product formation;Chen;Environ. Eng. Sci.,2010
3. Performance evaluation of the UV/H2O2 process on selected nitrogenous organic compounds: reductions of organic contents vs. corresponding C-, N-DBPs formations;Chen;Chemosphere,2011
4. Formation of N-nitrosodimethylamine (NDMA) from reaction of monochloramine: a new disinfection by-product;Choi;Water Res.,2002
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3. Removal characteristics of DON in pharmaceutical wastewater and its influence on the N-nitrosodimethylamine formation potential and acute toxicity of DOM;Water Research;2017-02
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