Degradation and transformation of natural organic matter accountable for disinfection byproduct formations by UV photolysis and UV/chlor(am)ine

Abstract

Abstract This research aimed to investigate the degradation of natural organic matter responsible for the formation of trihalomethane (THM), haloacetic acid (HAA) and haloacetonitrile (HAN) during ultraviolet (UV) photolysis and a co-exposure of UV with chlorine (UV/chlorine) and chloramine (UV/chloramine). Low pressure UV (LPUV) and vacuum UV (VUV) lamps were used for photolysis. VUV and LPUV irradiation changed aromatic/unsaturated structures to aliphatic ones, resulting in decreased THM and HAN formation. Following irradiation for 60 min, LPUV decreased THM and HAN by 16% ± 2% and 20% ± 6%, respectively. VUV decreased THM and HAN formation by 23% ± 3% and 20% ± 8%, respectively. HAA formation increased following photolysis. UV/chlorine treatment decreased THM, HAA and HAN. Higher chlorine doses had an inversely proportional relationship with THM and HAN formation. A chlorine dose of 4 mg·L−1 led to the greatest reductions, corresponding to 42% ± 2%, 10% ± 10% and 18% ± 6% for THM, HAA and HAN, respectively. UV/chloramine decreased the formation of THM more than UV/chlorine. With a chloramine dose of 4 mg·L−1, THM, HAA and HAN formation decreased by 74% ± 10%, 10% ± 10% and 11% ± 10%, respectively. This study showed the potential use of UV/chlor(am)ine for controlling the formation of THM, HAA and HAN.