Photolysis of cyflufenamid in liquid media

Author:

Zheng Zhangyu1,Zhang Chunyan1,Shi Haiyan1,Liu Zhiwei1,Duan Jinsheng12,Wang Minghua1

Affiliation:

1. Department of Pesticide Science, College of Plant Protection, Nanjing Agricultural University, State and Local Joint Engineering Research Center of Green Pesticide Invention and Application, Nanjing 210095, China

2. Institute of Plant Protection and Agro-Products Safety, Anhui Academy of Agricultural Sciences, Key Laboratory of Agro-Product Safety Risk Evaluation (Hefei), Hefei 230031, China

Abstract

Abstract The photolysis of cyflufenamid (CFA) in different organic solvents and water under ultraviolet irradiation was investigated. The photolytic rate constant and photolytic half-life were measured for the different solutions. Factors influencing the photolysis of CFA were investigated, including initial concentration, types of solvent, pH, occurrence of catalyst (TiO2), and environmental substances (Fe3+, Fe2+, NO3−, NO2−). Photolysis of CFA followed first-order kinetics in various systems, and the photolytic rate of CFA decreased with increased initial concentration. Photolytic rates of CFA in different solvents were as follows: n-hexane > methanol > acetonitrile > ultrapure water > ethyl acetate. The pH had a significant effect on the photolysis of CFA, and the photolysis rate reached its peak at pH 9.0. NO2− and TiO2 had positive effects on the photolysis of CFA, while Fe2+ had an adverse effect. NO3− in aqueous solution had no effect on the photolysis of CFA. In addition, the rates of photolysis were accelerated at lower concentrations of Fe3+ (0.5–5 mmol L−1) and decreased at higher concentrations (10 mmol L−1). Moreover, a main photolytic product of CFA was confirmed to be N-cyclopropoxy-2,3-difluoro-6-(trifluoromethyl)benzamide, and cleavage of the amido bond was proposed to be the predicted photolysis pathway in n-hexane.

Publisher

IWA Publishing

Subject

Water Science and Technology,Environmental Engineering

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