Photolytic degradation of chlorophenols from industrial wastewaters by organic oxidants peroxy acetic acid, para nitro benzoic acid and methyl ethyl ketone peroxide: identification of reaction products

Author:

Sharma Swati12,Mukhopadhyay Mausumi1,Murthy Zagabathuni Venkata Panchakshari1

Affiliation:

1. Department of Chemical Engineering, Sardar Vallabhbhai National Institute of Technology, Surat 395007, Gujarat, India

2. Department of Chemical Engineering, Sarvajanik College of Engineering and Technology, Surat 395001, Gujarat, India

Abstract

In this investigation, chlorophenol (CP) containing industrial wastewater was remediated by ultraviolet irradiation in conjunction with organic oxidants, peroxy acetic acid (PAA); para nitro benzoic acid (PNBA); and methyl ethyl ketone peroxide (MEKP). CP mineralization was studied with regard to chemical oxygen demand (COD) and chloride ion release under identical test conditions. COD depletion to the extent of 81% by PAA, 66% by PNBA, and 67% by MEKP was noted along with an upwardly mobile trend of chloride ion release upon irradiation of samples at 254 nm. A 90–99% decrease in CP concentration (as per high pressure liquid chromatography (HPLC) analysis) was achieved with an additional 15.0 ml of organic oxidant in all cases. Gas chromatography high resolution mass spectroscopy (GC-HRMS) results also indicated the formation of such reaction products as are free from chlorine substitutions. This treatment also leads to total decolorization of the collected samples.

Publisher

IWA Publishing

Subject

Water Science and Technology,Environmental Engineering

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