Improving vacuum-UV (VUV) photolysis of organic compounds in water with a phosphor converted xenon excimer lamp emitting at 193 nm

Author:

Schulze-Hennings U.1,Pötschke L.1,Wietor C.1,Bringmann S.1,Braun N.2,Hayashi D.3,Linnemann V.1,Pinnekamp J.1

Affiliation:

1. Institute of Environmental Engineering, RWTH Aachen University, Mies-van-der-Rohe-Str. 1, Aachen 52074, Germany

2. GVB GmbH, Nordstern – Park 2, Herzogenrath 52134, Germany

3. Philips Group Innovation, Research, High Tech Campus 4, 1.518, Eindhoven 5656 AE, The Netherlands

Abstract

A novel vacuum ultraviolet excimer lamp emitting light at 193 nm was used to investigate the degradation of organic micropollutants in ultrapure water and wastewater treatment plant (WWTP) effluent. Overall, light at 193 nm proved to be efficient to degrade the investigated micropollutants (diclofenac, diatrizoic acid, sulfamethoxazole). Experiments with WWTP effluent proved the ability of radiation at 193 nm to degrade micropollutants which are hardly removed with commonly used oxidation technologies like ozonation (diatrizoic acid, ethylenediaminetetraacetic acid, perfluorooctanoic acid, and perfluorooctanesulfonic acid).

Publisher

IWA Publishing

Subject

Water Science and Technology,Environmental Engineering

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