Chemical Models of Advanced Oxidation Processes

Author:

Glaze William H.1,Beltran Fernando2,Tuhkanen Tuula3,Kang Joon-Wun4

Affiliation:

1. Department of Environmental Sciences and Engineering, University of North Carolina, Chapel Hill, NC 27312, USA

2. Departamento de Ingenieria Quimica y Energetica, Universidad de Extremadura, Badajoz 06071, Spain

3. Department of Environmental Sciences, University of Kuopio, SF-70211 Kuopio, Finland

4. Department of Environmental and Industrial Hygiene, Yonsei University, Wonju Campus, Wonjus, Kangwon-Do 220-701, Korea

Abstract

Abstract Advanced oxidation processes (AOPs) have been defined as near-ambient temperature processes that involve the generation of highly reactive radical intermediates, especially the hydroxyl radical. These processes show promise for the destruction of hazardous organic substances in municipal and industrial wastes, in drinking water and in ultrapure water. Three types of AOPs are considered in this paper: catalyzed decomposition of ozone; ozone with hydrogen peroxide (Peroxone); and photolysis of hydrogen peroxide with ultraviolet radiation. Kinetic models for these processes are being developed based on known chemical and photochemical principles. The models take into account measured effects of radical scavengers such as bicarbonate; dose ratios of the oxidants or UV intensity; pH; and the presence of generic radical scavengers. The models are used to discuss two cases: oxidation of parts-per-million levels of nitrobenzene with ozone, Peroxone and peroxide/UV and oxidation of naphthalene and pentachlorophenol with peroxide/UV.

Publisher

IWA Publishing

Subject

Water Science and Technology

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3