Author:
Dan’ko V. A.,Indutnyi I. Z.,Min’ko V. I.,Shepelyavyi P. E.
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Instrumentation
Reference20 articles.
1. M. T. Kostishyn, E. V. Mikhailovskaya, and P. F. Romanenko, “On the Photographic Sensitivity Effect of Thin Semiconductor Layers Applied to Metal Substrates,” Fiz. Tverd. Tela 8(2), 571–572 (1966).
2. M. T. Kostyshin, E. V. Mikhailovskaya, P. F. Romanenko, and G. A. Sandul, “On the Photographic Sensitivity of Thin Semiconductor Layers,” Zh. Nauch. Prikl. Fotogr. Kinematogr. 10(6), 450–451 (1965).
3. I. Z. Indutnyi, A. V. Stronski, P. F. Romanenko, et al., “Manufacturing of Holographic Optical Elements with the Help of Chalcogenide Resists,” Proc. SPIE 2321, 352–354 (1994).
4. I. Z. Indutnyi, A. V. Stronski, and S. A. Kostioukevich, “Holographic Optical Element Fabrication Using Chalcogenide Layers,” Opt. Eng. 34(4), 1030–1039 (1995).
5. M. Vlcek, P. J. S. Ewen, and T. Wagner, “High Efficiency Diffraction Gratings in As-S Layers,” J. Non-Cryst. Solids 227–230, 743–747 (1998).
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