Kinetics and mechanism of chromium electrodeposition from methanesulfonate solutions of Cr(III) salts
Author:
Publisher
Allerton Press
Subject
Industrial and Manufacturing Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces
Link
http://link.springer.com/content/pdf/10.3103/S106837551405007X.pdf
Reference23 articles.
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2. Baral, A. and Engelken, R. Modeling, optimization, and comparative analysis of trivalent chromium electrodeposition from aqueous glycine and formic acid baths, J. Electrochem. Soc., 2005, vol. 152, pp. C504–C512.
3. Surviliene, S., Nivinskiene, O., Cesuniene, A., and Selskis, A., Effect of Cr(III) solution chemistry on electrodeposition of chromium, J. Appl. Electrochem., 2006, vol. 36, pp. 649–654.
4. Zeng, Z., Zhang, Y., Zhao, W., and Zhang, J., Role of complexing ligands in trivalent chromium electrodeposition, Surf. Coat. Technol., 2011, vol. 205, pp. 4771–4775.
5. Danilov, F.I., Protsenko, V.S., Gordiienko, V.O., Kwon, S.C., Lee, J.Y., and Kim, M., Nanocrystalline hard chromium electrodeposition from trivalent chromium bath containing carbamide and formic acid: structure, composition, electrochemical corrosion behavior, hardness and wear characteristics of deposits, Appl. Surf. Sci., 2011, vol. 257, pp. 8048–8053.
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