Author:
Topolyansky Pavel,Ermakov Sergey,Topolyansky Andrey
Abstract
The methodology for determining adhesion characteristics of thin-film coatings applied from the vapor phase and used to protect parts against wear and corrosion has been considered. The study of adhesion properties, along with deter-mination of thickness, composition of elements, structure, physical-mechanical, and tribological characteristics, as well as wear coefficient, al-lows evaluating and selecting the optimal coat-ing and best technology for its application for a specific industrial application. On the example of studying DLCPateks diamond-like coating of aC:H/a-SiOCN system deposited during final plasma hardening, adhesion characteristics were assessed according to ISO 20502:2005 by scratch testing and according to ISO 26443:2008 by indentation of Rockwell diamond indenter. The first tests were performed to determine the load at which the depth of penetration of the indenter into the coating - substrate composition stops growing smoothly, which characterizes the moment of destruction of the coating. The ratio of the load on the indenter, determined at the end of the passage of the coating thickness, to the load of occurrence of the first cracks or delamination, in these tests is conventionally called the adhesion coefficient. The influence of the coating thickness on the adhesion coefficient has been studied. The tests associated with the use of a Rockwell diamond indenter punch qualitatively evaluate the adhesion properties of the coating by comparing the obtained and normalized impressions. The results of the tests proved improved adhesion characteristics of DLCPateks coating.
Publisher
Voronezh State University of Forestry and Technologies named after G.F. Morozov
Subject
Industrial and Manufacturing Engineering,Metals and Alloys,Strategy and Management,Mechanical Engineering
Reference38 articles.
1. Donald M. Mattox. Handbook of Physical Vapor Deposition (PVD) Processing. Published by Elsevier Inc. – 2010. – p. 771., Donald M. Mattox. Handbook of Physical Vapor Deposition (PVD) Processing. Published by Elsevier Inc. – 2010. – p. 771
2. Hugh O. Pierson. Handbook of Chemical Vapor Deposition (CVD). Published by Elsevier Inc. – 2010. – p. 458., Hugh O. Pierson. Handbook of Chemical Vapor Deposition (CVD). Published by Elsevier Inc. – 2010. – p. 458
3. Наноструктурные покрытия / Под ред. Кавалейро А., Хоссон Д. Техносфера. – 2011. – 752 с., Nanostructured coatings / Ed. Cavaleiro A., Hosson D. Technosphere. – 2011. – 752 p.
4. Тополянский, П. А. Выбор оптимальной толщины покрытия при финишном плазменном упрочнении / П. А. Тополянский, А. П. Тополянский, Н. А. Соснин, С. А. Ермаков // Металлообработка. – 2010. – № 3. – С. 44-50., Topolyansky, P. A. Choice of the optimal coating thickness for finishing plasma hardening / P. A. Topolyansky, A. P. Topolyansky, N. A. Sosnin, S. A. Ermakov // Metal processing. – 2010. – №. 3. – P. 44-50.
5. Тополянский, П. А. Исследование структуры и элементного состава поверхности металла после финишного плазменного упрочнения / П. А. Тополянский, С. А. Ермаков, А. П. Тополянский // Металлообработка. – 2020. – № 3. – С. 35-46., Topolyansky, P. A. Research of the structure and elemental composition of the metal surface after finishing plasma hardening / P. A. Topolyansky, S. A. Ermakov, A. P. Topolyansky // Metal processing. – 2020. – №. 3. – P. 35-46.
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