In Situ Transmission Electron Microscopy Study on the Reaction Kinetics of the Ni/Zr-interlayer/Ge System-Reference-Cited by-同舟云学术

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In Situ Transmission Electron Microscopy Study on the Reaction Kinetics of the Ni/Zr-interlayer/Ge System

Published:2015-03-30 Issue:1 Volume:45 Page:16-22
ISSN:2287-5123
Container-title:Applied Microscopy
language:en
Short-container-title:AM

Author:

Lee Jae-Wook¹,Bae Jee-Hwan¹,Kim Tae-Hoon¹,Shin Keesam²,Lee Je-Hyun²,Song Jung-il³,Yang Cheol-Woong¹

Affiliation:

1. School of Advanced Materials Science & Engineering, Sungkyunkwan University, Suwon 440-746, Korea

2. School of Nano and Advanced Materials Engineering, Changwon National University, Changwon 641-773, Korea

3. Department of Mechanical Engineering, Changwon National University, Changwon 641-773, Korea

Funder

Ministry of Science, ICT and Future Planning(MSIP)

Ministry of Trade, Industry and Energy(Ministry of Trade, Industry and Energy, Korea)

Publisher

Korean Society of Electron Microscopy

Link

http://ocean.kisti.re.kr/downfile/crosscheck/ksem/JAKO201510763641459.pdf

Reference11 articles.

1. Texture of NiGe on Ge(001) and its evolution with formation temperature

2. Calorimetric Study of Amorphization in Planar, Binary, Multilayer, Thin-Film Diffusion Couples of Ni and Zr

3. Quantitative investigation of titanium/amorphous-silicon multilayer thin film reactions

4. Study of thermal stability of nickel monogermanide on single- and polycrystalline germanium substrates

5. Lee, JW, Bae, JH, Kim, TH, Kim, H, Min, SH, Shin, K, Lee, JH, Song, JI, and Yang, CW (2015). Kinetics of the Ni/Ta-interlayer/Ge reactions studied by in situ transmission electron microscopy. Sci Adv Mater. , .

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