Qualitative Diagnosis Method Based on Process History in Semiconductor Manufacturing Process

Author:

CHAKAROUN Mohamad,DJEZIRI Mohand,OULADSINE Mustapha,PINATON Jacques

Publisher

Elsevier BV

Subject

General Medicine

Reference22 articles.

1. A neural-network approach to recognize defect spatial pattern in semi-conductor fabrication;Chen;Semiconductor Manufacturing, IEEE Transactions on,2000

2. Rong-Huei Chen and Chih-Ming Fan. Treatment of missing values for association rule-based tool commonality analysis in semiconductor manufacturing. In Automation Science and Engineering (CASE), 2012 IEEE International Conference on, pages 886-891. IEEE, 2012.

3. Stéphane Dauzère-Pérès, J Rouveyrol, Claude Yugma, and Philippe Vialletelle. A smart sampling algorithm to minimize risk dynamically. In Advanced Semiconductor Manufacturing Conference (ASMC), 2010 IEEE/SEMI, pages 307-310. IEEE, 2010.

4. Yu-Chin Hsu, Rong-Huei Chen, and Chih-Min Fan. Identifying ill tool combinations via gibbs sampler for semi-conductor manufacturing yield diagnosis. In Proceedings of the Winter Simulation Conference, page 199. Winter Simulation Conference, 2012.

5. George Kong. Tool commonality analysis for yield enhancement. In Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop, pages 202-205. IEEE, 2002.

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