Predictive Ratio Control of Multizone Thermal Processing System in Lithography-Reference-Cited by-同舟云学术

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Predictive Ratio Control of Multizone Thermal Processing System in Lithography

Published:2008 Issue:2 Volume:41 Page:10863-10868
ISSN:1474-6670
Container-title:IFAC Proceedings Volumes
language:en
Short-container-title:IFAC Proceedings Volumes

Author:

Tay A.,Tan K.K.,Zhao S.,Lee T.H.

Publisher

Elsevier BV

Subject

General Medicine

Reference12 articles.

1. Process Dynamics and control;Seborg,1989

2. Controlling multivariable processes;Shinskey,1981

3. Process-control systems;Shinskey,1996

4. PID control design based on a GPC approach, Ind;Tan;Eng. Chem. Res.,2002

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