CONTROL OF THE OPTICAL SURFACE PURITY OF THE ELEMENTS BY THE ELLIPSOMETRIC METHOD

Abstract

The possibility of controlling the chemical purity of the surface of optical elements by the ellipsometric method has been analyzed. The rationale of the possibility of measuring the parameters of contaminating films on the optical surface of elements by the ellipsometric method has been given simplification has been shown of the process of determining the thickness of the contaminating film while expanding the possibility of its measurement on an optical element made of different materials. Ellipsometric studies of freshly polished and used metal mirrors made of copper and copper alloy (zirconium bronze), aluminum and its alloys AMG-6, AL-9, AL-24 have been carried out. Research has also been conducted on elements made of K-8 and K-108 (State Standard 3514-94) optical glasses, which are the most typical materials used for manufacture of optical parts for laser technique of visible and near IR-range, from single crystals of NaCl, BaF2 and sapphire (Al2O3). Parameters of contaminating films on the surface of these elements have been measured. It has been concluded that it is advisable to use the ellipsometry method during the input (before carrying out physicochemical cleaning) and during the output (after cleaning) control of the optical element to assess the contamination of the optical surface and also for the quantitative analysis of the concentration of contaminants on the optical surface of the elements while working off the technology of their physicochemical cleaning.