SILICON PLASMA HEATING IN AIR AT THE COMBINED BICHROMATIC LASER RADIATION AT WAVELENGTHS OF 355 and 532 nm-Reference-Cited by-同舟云学术

SILICON PLASMA HEATING IN AIR AT THE COMBINED BICHROMATIC LASER RADIATION AT WAVELENGTHS OF 355 and 532 nm

Published:2021-11-24 Issue:6 Volume:88 Page:900-906
ISSN:0514-7506
Container-title:Journal of Applied Spectroscopy
language:
Short-container-title:Ž. prikl. spektrosk. (Minsk)

Author:

Chumakov A. N.¹,Lychkoskyi V. V.¹

Affiliation:

1. B. I. Stepanov Institute Physics of the National Academy of Sciences of Belarus

Abstract

The formation and heating of laser plasma under the irradiation of silicon in ambient air by pulsed laser radiation with wavelengths of 355 and 532 nm at radiation power density up to 5 GW/cm2 has been experimentally investigated. An increased efficiency of the formation and heating of ablation plasma under bichromatic irradiation of silicon with advanced action of nanosecond pulses with a wavelength of 355 nm has been established.

Publisher

National Academy of Sciences of Belarus

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