Modulated structures in amorphous films of Cr-silicide prepared by electron-beam-deposition-Reference-Cited by-同舟云学术

Modulated structures in amorphous films of Cr-silicide prepared by electron-beam-deposition

Published:2006-03-01 Issue:3 Volume:97 Page:310-314
ISSN:2195-8556
Container-title:International Journal of Materials Research
language:en
Short-container-title:

Author:

Kitano Yasuyuki¹,Yamamoto Koichi²,Wada Masashi²,Yin Jingtian¹,Toda Yumio¹,Tanaka Koji¹,Tanabe Eishi³,Komatsu Masao⁴,Sakai Tetsuo¹

Affiliation:

1. National Institute of Advanced Industrial Sci. & Tech. Kansai-centre , Osaka , Japan

2. Fukuda Metal Foil & Powder Co. Ltd. , Kyoto , Japan

3. Western Hiroshima Industrial Research Institute , Higashi-Hiroshima , Japan

4. Hiroshima Institute of Technology , Hiroshima , Japan

Abstract

Abstract Amorphous Cr-silicide films are prepared by electron-beam-deposition on a Cu-substrate at room temperature. The microstructures of as-grown films are investigated using transmission and analytical electron microscopy. The morphology of the amorphous films is dendritic. In addition, one-dimensional concentration modulations are observed. The modulated structure is revealed not only by TEM imaging but also by a series of satellite spots at the centre of the diffraction pattern. This concentration modulation is confirmed by analytical electron microscopy.

Publisher

Walter de Gruyter GmbH

Subject

Materials Chemistry,Metals and Alloys,Physical and Theoretical Chemistry,Condensed Matter Physics

Link

https://www.degruyter.com/document/doi/10.1515/ijmr-2006-0049/pdf

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