Ground plane and selective buried oxide based planar junctionless transistor
Author:
Affiliation:
1. Software Department , College of Computer Science and Information Technology, University of Kirkuk , Kirkuk , Iraq
2. Department of Electronics and Insutrumentation technology , University of Kashmir , Srinagar , J&K , India
Abstract
Publisher
Walter de Gruyter GmbH
Subject
Electrical and Electronic Engineering
Link
https://www.degruyter.com/document/doi/10.1515/freq-2021-0059/pdf
Reference20 articles.
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2. J.-P. Colinge, C.-W. Lee, A. Afzalian et al.., “Nanowire transistors without junctions,” Nat. Nanotechnol., vol. 5, no. 3, pp. 225–229, 2010, https://doi.org/10.1038/nnano.2010.15.
3. F. Bashir, S. A. Loan, M. Rafat, A. R. M. Alamoud, and S. A. Abbasi, “A high-performance source engineered charge plasma-based Schottky MOSFET on SOI,” IEEE Trans. Electron. Dev., vol. 62, no. 10, pp. 3357–3364, 2015, https://doi.org/10.1109/ted.2015.2464112.
4. R. J. Hueting, B. Rajasekharan, C. Salm, and J. Schmitz, “The charge plasma PN diode,” IEEE Electron. Device Lett., vol. 29, no. 12, pp. 1367–1369, 2008, https://doi.org/10.1109/LED.2008.2006864.
5. A. Lahgere, C. Sahu, and J. Singh, “PVT-aware design of dopingless dynamically configurable tunnel FET,” IEEE Trans. Electron. Dev., vol. 62, no. 8, pp. 2404–2409, 2015, https://doi.org/10.1109/ted.2015.2446615.
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