Plasma characterization of the gas-puff target source dedicated for soft X-ray microscopy using SiC detectors-Reference-Cited by-同舟云学术

Plasma characterization of the gas-puff target source dedicated for soft X-ray microscopy using SiC detectors

Published:2016-06-01 Issue:2 Volume:61 Page:139-143
ISSN:0029-5922
Container-title:Nukleonika
language:en
Short-container-title:

Author:

Torrisi Alfio¹,Wachulak Przemysław¹,Torrisi Lorenzo²,Bartnik Andrzej¹,Węgrzyński Łukasz¹,Fiedorowicz Henryk¹

Affiliation:

1. Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Str., 00-908 Warsaw, Poland

2. Department of Physics Sciences – MIFT, University of Messina, V. le F. S. d’Alcontres 31, 981 66 S. Agata, Messina, Italy

Abstract

Abstract An Nd:YAG pulsed laser was employed to irradiate a nitrogen gas-puff target. The interaction gives rise to the emission of soft X-ray (SXR) radiation in the ‘water window’ spectral range (λ= 2.3÷4.4 nm). This source was already successfully employed to perform the SXR microscopy. In this work, a Silicon Carbide (SiC) detector was used to characterize the nitrogen plasma emission in terms of gas-puff target parameters. The measurements show applicability of SiC detectors for SXR plasma characterization.

Publisher

Walter de Gruyter GmbH

Subject

Waste Management and Disposal,Condensed Matter Physics,Safety, Risk, Reliability and Quality,Instrumentation,Nuclear Energy and Engineering,Nuclear and High Energy Physics

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